Development of a hybrid photopolymer for stereolithography

Gan Zhiwei; Mo Jianhua; Huang Shuhuai; Xie Hongquan

doi:10.1007/BF02861482

Journal of Wuhan University of Technology Materials Science Edition ›› 2006, Vol. 21 ›› Issue (1) : 99 -101. DOI: 10.1007/BF02861482

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Development of a hybrid photopolymer for stereolithography

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Abstract

New liquid free radical-cationic hybrid photopolymer, consisting of acrylate-based photocurable resin and epoxy-based photosensitive resin for stereolithography by UV laser was developed. The experiment results indicated that the hybrid photopolymer exhibits advantages of both the acrylate-based photosensitive resin and the epoxy-based photosensitive polymer contained in the hybrid system with relatively high photospeed and low linear shrinkage. Stereolithography parts without obvious distortion were built on the stereolithography apparatus HRPLA-I from this hybrid resin successfully and efficiently.

Keywords

stereolithography / UV-curing resin / free radical-cationic hybrid photopolymer / stereolithography parts

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Gan Zhiwei, Mo Jianhua, Huang Shuhuai, Xie Hongquan. Development of a hybrid photopolymer for stereolithography. Journal of Wuhan University of Technology Materials Science Edition, 2006, 21(1): 99-101 DOI:10.1007/BF02861482

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