Synthesis of a novel photosensitive prepolymer with trimethylolpropane triglycidylether and acrylic acid as starting materials

Abstract

A novel photosensitive prepolymer of trimethylolpropane triglycidylether triacrylate was synthesized by utilizing trimethylolpropane triglycidylether and acrylic acid as two starting materials, triphenyl phosphine as catalyst and p-hydroxyanisole as inhibitor. The optimum synthesis conditions were that the concentration of triphenyl phosphine was 0.85wt% of reactants, the concentration of p-hydroxyanisole was 0.3wt% of reactants, and the reaction temperature was at 90–110°C. Benzil dimethyl ketal of a UV-cured initiator was added to the synthesized trimethylolpropane triglycidylether triacrylate to prepare a kind of UV-cured coating. The mechanical properties of the UV-cured films were determined, giving 28. 43 MPa of tensile strength, 965. 59 MPa of Young’s modulus and 4.10% of elongation at tear.

Keywords

synthesis / trimethylolpropane triglycidylether / acrylic acid / UV-cured film

References

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