Microstructure and AMR properties of permalloy films sputtered on (Ni0.81Fe0.19)0.66Cr0.34 buffer

Yang Xiao-fei; Peng Zi-long; Liao Hong-wei; Li Zuo-yi

doi:10.1007/BF02838355

Journal of Wuhan University of Technology Materials Science Edition ›› 2004, Vol. 19 ›› Issue (1) : 23 -25. DOI: 10.1007/BF02838355

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Microstructure and AMR properties of permalloy films sputtered on (Ni_0.81Fe_0.19)_0.66Cr_0.34 buffer

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Abstract

(Ni_0.81 Fe_0.19)_0.66 Cr_0.34 has a high resistivity and a crystal structure close to that of Ni_0.81 Fe_0.19. The electrical and X-ray diffraction measurements prove that a thin NiFeCr seed layer induces a well (111)-orented Ni_0.81 Fe_0.19 film. Post-annealing treatment improves the magnetic properties of (Ni_0.81Fe_0.19)_0.66 Cr_0.34(45Å)/Ni_0.81Fe_0.19 (150Å)/Ta(55Å) thin film prepared under a deposition field, whereas the inter-diffusion of NiFe/Ta deteriorates the magnetoresistance properties of the film.

Keywords

permalloy film / AMR / buffer layer

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Yang Xiao-fei, Peng Zi-long, Liao Hong-wei, Li Zuo-yi. Microstructure and AMR properties of permalloy films sputtered on (Ni_0.81Fe_0.19)_0.66Cr_0.34 buffer. Journal of Wuhan University of Technology Materials Science Edition, 2004, 19(1): 23-25 DOI:10.1007/BF02838355

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