Enhanced photonic nanojets for submicron patterning

Abstract

Photonic nanojets (PNJs) have a wide range of applications in laser processing, nanolithography, optical high-density storage, super-resolution microscopy, and other fields due to their processing capacity to overcome the diffraction limit. Herein, we control static microsphere be developed into the motion state to fabricate vector graphics nano-grooves. The microspheres roll on the substrate while the laser is kept synchronously irradiated, and the overlapping PNJ ablated craters form patterned grooves on the indium-tin oxide (ITO) substrate. Thus, PNJ has been expanded from “point” processing to “line” processing. The fabricated nano grooves have high continuity and consistency. Whereas, the precise customization of critical groove dimension can be achieved via modulation in diameter and kinetics of dielectric microshperes. Furthermore, by etching vectographs on an ITO conductive glass substrate, we demonstrated the advantages and potential of the proposed method in nanopatterning. The proposed method effectively reduces the cost and complexity of photonic nanojets applied in nanopatterning. The proposed nanopatterning methodology will play a vital role in the fabrication of semiconductor materials, sensors, microfluidic devices, surface-enhanced Raman scattering (SERS), biomedicine, nanoscience and nanoengineering.

Keywords

photonic nanojets / nano-grooves / synchronously irradiated / nanoengineering

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