A new approach for deposition of silver film from AgCl through successive ionic layer adsorption and reaction technique

Abstract

An attempt was made to deposit thin film of silver onto the glass substrate by using AgCl precursor, instead of conventional precursor AgNO₃ with vitamin C by inexpensive and convenient successive ionic layer adsorption and reaction (SILAR) method. The deposited silver thin film was characterized by X-ray diffraction (XRD) analysis, scanning electron microscope (SEM), UV-visible and electrical I-V study. The diffraction study showed FCC structure of metallic silver in good agreement with the standard values of JCPDS (04–0783). SEM reveals flower like nano particles produced on the substrate. The surface plasmon resonance (SPR) peak in the UV-visible spectrum shows maximum absorption at 350 nm. The film shows an ohmic behavior and its electrical resistivity was found ~10³ Ω·cm at room temperature.

Keywords

thin films / metals / materials characterization / sol-gel / optical properties / silver

References

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