Determination of trace elements in high purity nickel by high resolution inductively coupled plasma mass spectrometry

Abstract

The contents of Mg, Al, Si, Ti, Cr, Mn, Fe, Co, Cu, Ga, As, Se, Cd, Sb, Pb and Bi in high purity nickel were determined by high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS). The sample was dissolved in HNO₃ and HCl by microwave digestion. Most of the spectral interferences could be avoided by measuring in the high resolution mode. The matrix effects because of the presence of excess HCl and nickel were evaluated. Correction for matrix effects was made using Sc, Rh and Tl as internal standards. The optimum conditions for the determination were tested and discussed. The detection limits range from 0.012 to 1.76 μg/g depending on the type of elements. The applicability of the proposed method is also validated by the analysis of high purity nickel reference material (NIST SRM 671). The relative standard deviation (RSD) is less than 3.3%. Results for determination of trace elements in high purity nickel were presented.

Keywords

high resolution inductively coupled plasma mass spectrometry / high purity nickel / trace element / matrix effect / internal standard

References

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