Fabrication of micro carbon pillar by laser-induced chemical vapor deposition

Abstract

Argon ion laser was used as the induced light source and ethane (C₂H₄) was selected as the precursor gas, in the variety ranges of laser power from 0.5 W to 4.5 W and the pressure of the precursor gas from 225×133.3 Pa to 680×133.3 Pa, the experiments of laser induced chemical vapor deposition were proceeded for fabrication of micro carbon pillar. In the experiments, the influences of power of laser and pressure of work gas on the diameter and length of micro carbon pillar were investigated, the variety on averaged growth rate of carbon pillar with the laser irradiation time and moving speed of focus was discussed. Based on experiment data, the micro carbon pillar with an aspect ratio of over 500 was built through the method of moving the focus.

Keywords

Laser-induced chemical vapor deposition (LCVD) / growing rapid / diameter / microcarbon

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