InAsSb thick epilayers applied to long wavelength photoconductors

Yu-zhu Gao , Xiu-ying Gong , Guang-hui Wu , Yan-bin Feng , Takamitsu Makino , Hirofumi Kan , Tadanobu Koyama , Yasuhiro Hayakawa

International Journal of Minerals, Metallurgy, and Materials ›› 2013, Vol. 20 ›› Issue (4) : 393 -396.

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International Journal of Minerals, Metallurgy, and Materials ›› 2013, Vol. 20 ›› Issue (4) : 393 -396. DOI: 10.1007/s12613-013-0741-4
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InAsSb thick epilayers applied to long wavelength photoconductors

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Abstract

InAs0.052Sb0.948 epilayers with cutoff wavelengths longer than 8 μm were successfully grown on InAs substrates using melt epitaxy (ME). Scanning electron microscopy observations show that the interface between the epilayers and substrates is flat, indicating the good quality of the epilayers, and the thickness of the epilayers is 40 μm. Photoconductors were fabricated using InAs0.052Sb0.948 thick epilayers grown by ME. Ge optical lenses were set on the photoconductors. At room temperature, the photoresponse wavelength range was 2–10 μm. The peak detectivity D λp * reached 5.4 × 109 cm·Hz1/2·W−1 for the immersed detectors. The detectivity D* was 9.3 × 108 and 1.3 × 108 cm·Hz1/2·W−1 at the wavelength of 8 and 9 μm, respectively. The good performance of the uncooled InAsSb detectors was experimentally validated.

Keywords

semiconducting indium compounds / thick epilayers / long wavelength / photoconductors / detectivity

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Yu-zhu Gao, Xiu-ying Gong, Guang-hui Wu, Yan-bin Feng, Takamitsu Makino, Hirofumi Kan, Tadanobu Koyama, Yasuhiro Hayakawa. InAsSb thick epilayers applied to long wavelength photoconductors. International Journal of Minerals, Metallurgy, and Materials, 2013, 20(4): 393-396 DOI:10.1007/s12613-013-0741-4

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