Simple method to rapidly fabricate chain-like carbon nanotube films and its field emission properties

Abstract

A simple process to fabricate chain-like carbon nanotube (CNT) films by microwave plasma-enhanced chemical vapor deposition (MPCVD) was developed successfully. Prior to deposition, the Ti/Al₂O₃ substrates were ground with Fe-doped SiO₂ powder. The nano-structure of the deposited films was analyzed by scanning electron microscopy (SEM), transmission electron microscopy (TEM), and Raman spectroscopy. The field electron emission characteristics of the chain-like carbon nanotube films were measured under the vacuum of 10⁻⁵ Pa. The low turn-on field of 0.80 V/μm and the emission current density of 8.5 mA/cm² at the electric field of 3.0 V/μm are obtained. Based on the above results, chain-like carbon nanotube films probably have important applications in cold cathode materials and electrode materials.

Keywords

carbon nanotube (CNT) / chain-like / film / microwave plasma-enhanced chemical vapor deposition (MPCVD) / field emission

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