RESEARCH ARTICLE

Application of minimum projection uniformity criterion in complementary designs for q-level factorials

  • Hong QIN 1 ,
  • Zhenghong WANG , 1,2
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  • 1. Faculty of Mathematics and Statistics, Central China Normal University, Wuhan 430079, China
  • 2. School of Mathematics and Statistics, South-Central University for Nationalities, Wuhan 430074, China

Received date: 02 Aug 2013

Accepted date: 11 Dec 2014

Published date: 12 Feb 2015

Copyright

2014 Higher Education Press and Springer-Verlag Berlin Heidelberg

Abstract

We study the complementary design problem, which is to express the uniformity pattern of a q-level design in terms of that of its complementary design. Here, a pair of complementary designs form a design in which all the Hamming distances of any two distinct runs are the same, and the uniformity pattern proposed by H. Qin, Z. Wang, and K. Chatterjee [J. Statist. Plann. Inference, 2012, 142: 1170–1177] comes from discrete discrepancy for q-level designs. Based on relationships of the uniformity pattern between a pair of complementary designs, we propose a minimum projection uniformity rule to assess and compare q-level factorials.

Cite this article

Hong QIN , Zhenghong WANG . Application of minimum projection uniformity criterion in complementary designs for q-level factorials[J]. Frontiers of Mathematics in China, 2015 , 10(2) : 339 -350 . DOI: 10.1007/s11464-015-0446-2

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