A new constrained maximum margin approach to discriminative learning of Bayesian classifiers

Ke GUO , Xia-bi LIU , Lun-hao GUO , Zong-jie LI , Zeng-min GENG

Front. Inform. Technol. Electron. Eng ›› 2018, Vol. 19 ›› Issue (5) : 639 -650.

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Front. Inform. Technol. Electron. Eng ›› 2018, Vol. 19 ›› Issue (5) : 639 -650. DOI: 10.1631/FITEE.1700007
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A new constrained maximum margin approach to discriminative learning of Bayesian classifiers

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Abstract

We propose a novel discriminative learning approach for Bayesian pattern classification, called ‘constrained maximum margin (CMM)’. We define the margin between two classes as the difference between the minimum decision value for positive samples and the maximum decision value for negative samples. The learning problem is to maximize the margin under the constraint that each training pattern is classified correctly. This nonlinear programming problem is solved using the sequential unconstrained minimization technique. We applied the proposed CMM approach to learn Bayesian classifiers based on Gaussian mixture models, and conducted the experiments on 10 UCI datasets. The performance of our approach was compared with those of the expectation-maximization algorithm, the support vector machine, and other state-of-the-art approaches. The experimental results demonstrated the effectiveness of our approach.

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Discriminative learning / Statistical modeling / Bayesian pattern classifiers / Gaussian mixture models / UCI datasets

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Ke GUO, Xia-bi LIU, Lun-hao GUO, Zong-jie LI, Zeng-min GENG. A new constrained maximum margin approach to discriminative learning of Bayesian classifiers. Front. Inform. Technol. Electron. Eng, 2018, 19(5): 639-650 DOI:10.1631/FITEE.1700007

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