The design and fabrication on gate type resonant tunneling transistor

Front. Electr. Electron. Eng. ›› 2008, Vol. 3 ›› Issue (2) : 227 -233.

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Front. Electr. Electron. Eng. ›› 2008, Vol. 3 ›› Issue (2) : 227 -233. DOI: 10.1007/s11460-008-0029-z

The design and fabrication on gate type resonant tunneling transistor

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Abstract

In light of fabricating resonant tunneling diode (RTD), in this paper a GaAs-based resonant tunneling transistor with gate structure (GRTT) has been designed and fabricated successfully. A systematic depiction centers on the designs of material structure, device structure, photolithography mask, fabrication of device and the measurement and analysis of parameters. The fabricated GRTT has a maximum PVCR of 46 and a maximum transconductance of 8 mS. The work lays the foundation for further improvement on the performance and parameters of RTT.

Keywords

resonant tunneling transistor (RTT) / gate controlled device / GaAs based quantum device

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null. The design and fabrication on gate type resonant tunneling transistor. Front. Electr. Electron. Eng., 2008, 3(2): 227-233 DOI:10.1007/s11460-008-0029-z

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