A Computer Simulation Study on Deposition Patterns of Cyclic Diblock Copolymer Solution Nanodroplets: Influence of Polymer Length and Concentration

Abstract

Molecular dynamics simulations are conducted to investigate the deposition patterns of cyclic diblock copolymer solution nanodroplets on solid surfaces (walls). The primary focus is how initial polymer concentration, chain length, and solvent-wall interaction affect these patterns. Deposition patterns are categorized into phase diagrams, mainly composed of multihollow, coffee-ring, and multilayer structures. We also study the deposition of polymer blocks with different adsorption behavior by adjusting the interaction strength between the polymer block and the wall [ε _A(B)W], including weakly adsorbable (ε _A(B)W=0.6), moderately adsorbable (ε _A(B)W=1.0), and strongly adsorbable (ε _A(B)W=1.2) polymer blocks. This study identifies the key factors influencing the droplet’s deposition structure and elucidates the mechanisms behind pattern formation. The findings contribute to the design of deposition patterns for cyclic diblock copolymer solution nanodroplets, enhancing applications related to droplet evaporation.

Keywords

Cyclic diblock copolymer / Nanodroplet / Evaporation / Deposition pattern / Chain length and concentration

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RIGHTS & PERMISSIONS

Jilin University, The Editorial Department of Chemical Research in Chinese Universities and Springer-Verlag GmbH