Deformation, failure and removal mechanisms of thin film structures in abrasive machining

Cheng-Wei Kang , Han Huang

Advances in Manufacturing ›› 2017, Vol. 5 ›› Issue (1) : 1 -19.

PDF
Advances in Manufacturing ›› 2017, Vol. 5 ›› Issue (1) : 1 -19. DOI: 10.1007/s40436-016-0165-2
Article

Deformation, failure and removal mechanisms of thin film structures in abrasive machining

Author information +
History +
PDF

Abstract

Thin film structures are becoming increasingly more important for industrial applications such as the making of solar panels, microelectronic devices and micro systems. However, the challenges encountered in the machining of thin film structures have been a bottleneck that impedes further wide spread uses of such structures. The development of material removal processes that are capable of producing a damage free surface at high removal rates is critical for cost effective production. Such development relies highly on a comprehensive understanding of the deformation, failure and removal mechanisms of thin film structures involved in mechanical loading. In this paper, the current understanding of the deformation characteristics of thin film systems was reviewed to provide important insights into the interfacial failure under mechanical loading, with focuses on the interfacial failure mechanisms and existing problems in the machining of thin film structures. The key characterization techniques were outlined. In particular, the recent progress in the abrasive machining of a thin film multilayer structure was summarized. The potential research directions were also presented in the end of the review.

Keywords

Abrasive machining / Thin film / Bilayer / Multilayer / Interface / Deformation / Failure

Cite this article

Download citation ▾
Cheng-Wei Kang, Han Huang. Deformation, failure and removal mechanisms of thin film structures in abrasive machining. Advances in Manufacturing, 2017, 5(1): 1-19 DOI:10.1007/s40436-016-0165-2

登录浏览全文

4963

注册一个新账户 忘记密码

References

[1]

Bhusan B. Springer handbook of nanotechnology, 2003, New York: Springer

[2]

Chen Y, McIntyre PC. Lead zirconate titanate ferroelectric thin film capacitors: effects of surface treatments on ferroelectric properties. Appl Phys Lett, 2007, 91: 072910.

[3]

Jayaraman V, Lin Y, Pakala M, et al. Fabrication of ultrathin metallic membranes on ceramic supports by sputter deposition. J Membr Sci, 1995, 99: 89-100.

[4]

Kim SS, Kim ST, Ahn JM, et al. Magnetic and microwave absorbing properties of Co-Fe thin films plated on hollow ceramic microspheres of low density. J Magn Magn Mater, 2004, 271: 39-45.

[5]

Bowden N, Brittain S, Evans AG, et al. Spontaneous formation of ordered structures in thin films of metals supported on an elastomeric polymer. Nature, 1998, 393: 146-149.

[6]

Schmitt J, Decher G, Dressick WJ, et al. Metal nanoparticle/polymer superlattice films: fabrication and control of layer structure. Adv Mater, 1997, 9: 61-65.

[7]

Bouclé J, Ravirajanac P, Nelson J (2007) Hybrid polymer-metal oxide thin films for photovoltaic applications. J Mater Chem 17:3141–3153

[8]

Ajayan PM, Schadler LS, Braun PV. Nanocomposite science and technology, 2006, New York: Wiley

[9]

Giannelis EP. Polymer layered silicate nanocomposites. Adv Mater, 1996, 8: 29-35.

[10]

Favache A, Sacre CH, Coulombier M, et al. Fracture mechanics based analysis of the scratch resistance of thin brittle coatings on a soft interlayer. Wear, 2015, 330: 461-468.

[11]

Wang J, Neaton J, Zheng H, et al. Epitaxial BiFeO3 multiferroic thin film heterostructures. Science, 2003, 299: 1719-1722.

[12]

Pang SC, Anderson MA, Chapman TW. Novel electrode materials for thin-film ultracapacitors: comparison of electrochemical properties of sol-gel-derived and electrodeposited manganese dioxide. J Electrochem Soc, 2000, 147: 444-450.

[13]

Sumitomo T, Huang H, Zhou L. Deformation and material removal in a nanoscale multi-layer thin film solar panel using nanoscratch. Int J Mach Tools Manuf, 2011, 51: 182-189.

[14]

Sumitomo T, Huang H, Zhou L, et al. Nanogrinding of multi-layered thin film amorphous Si solar panels. Int J Mach Tools Manuf, 2011, 51: 797-805.

[15]

Kim KS, Kim J. Elasto-plastic analysis of the peel test for thin film adhesion. J Eng Mater Technol, 1988, 110: 266-273.

[16]

Hegemann D, Brunner H, Oehr C. Plasma treatment of polymers for surface and adhesion improvement. Nucl Instrum Methods Phys Res Sect B, 2003, 208: 281-286.

[17]

Kohl JG, Singer IL. Pull-off behavior of epoxy bonded to silicone duplex coatings. Prog Org Coat, 1999, 36: 15-20.

[18]

Ma Q. A four-point bending technique for studying subcritical crack growth in thin films and at interfaces. J Mater Res, 1997, 12: 840-845.

[19]

Dayal P, Savvides N, Hoffman M. Characterisation of nanolayered aluminium/palladium thin films using nanoindentation. Thin Solid Films, 2009, 517: 3698-3703.

[20]

Pharr G, Oliver W. Measurement of thin-film mechanical-properties using nanoindentation. MRS Bull, 1992, 17: 28-33.

[21]

Navamathavan R, Kim KK, Hwang DK, et al. A nanoindentation study of the mechanical properties of ZnO thin films on (0001) sapphire. Appl Surf Sci, 2006, 253: 464-467.

[22]

Fang TH, Chang WJ, Lin CM. Nanoindentation and nanoscratch characteristics of Si and GaAs. Microelectron Eng, 2005, 77: 389-398.

[23]

Wu Y, Huang H, Zou J, et al. Nanoscratch-induced phase transformation of monocrystalline Si. Scripta Mater, 2010, 63: 847-850.

[24]

Wu Y, Huang H, Zou J, et al. Nanoscratch-induced deformation of single crystal silicon. J Vac Sci Technol B, 2009, 27: 1374-1377.

[25]

Chang SY, Tsai HC, Chang JY, et al. Analyses of interface adhesion between porous SiOCH low-k film and SiCN layers by nanoindentation and nanoscratch tests. Thin Solid Films, 2008, 516: 5334-5338.

[26]

Kang C, Huang H. Mechanical load-induced interfacial failure of a thin film multilayer in nanoscratching and diamond lapping. J Mater Process Technol, 2016, 229: 528-540.

[27]

Lu M, Xie H, Huang H, et al. Indentation-induced delamination of plasma-enhanced chemical vapor deposition silicon nitride film on gallium arsenide substrate. J Mater Res, 2013, 28: 1047-1055.

[28]

Roy S, Darque-Ceretti E, Felder E, et al. Experimental analysis and finite element modelling of nano-scratch test applied on 40–120 nm SiCN thin films deposited on Cu/Si substrate. Thin Solid Films, 2010, 518: 3859-3865.

[29]

Rao SS. The finite element method in engineering, 2010, Amsterdam: Elsevier

[30]

Torres-Torres D, Munoz-Saldana J, Gutierrez-Ladron-de Guevara L, et al. Geometry and bluntness tip effects on elastic–plastic behaviour during nanoindentation of fused silica: experimental and FE simulation. Model Simul Mater Sci Eng, 2010, 18: 1825-1830.

[31]

Lee KM, Yeo CD, Polycarpou AA. Relationship between scratch hardness and yield strength of elastic perfectly plastic materials using finite element analysis. J Mater Res, 2008, 23: 2229-2237.

[32]

Lu M, Huang H. Determination of the energy release rate in the interfacial delamination of silicon nitride film on gallium arsenide substrate via nanoindentation. J Mater Res, 2014, 29: 801-810.

[33]

Evans A, Drory M, Hu M. The cracking and decohesion of thin films. J Mater Res, 1988, 3: 1043-1049.

[34]

Fischer-Cripps AC. Critical review of analysis and interpretation of nanoindentation test data. Surf Coat Technol, 2006, 200: 4153-4165.

[35]

Oliver WC, Pharr GM. Improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments. J Mater Res, 1992, 7: 1564-1583.

[36]

Gerberich W, Yu W, Kramer D, et al. Elastic loading and elastoplastic unloading from nanometer level indentations for modulus determinations. J Mater Res, 1998, 13: 421-439.

[37]

Taylor CA, Wayne MF, Chiu WK. Residual stress measurement in thin carbon films by Raman spectroscopy and nanoindentation. Thin Solid Films, 2003, 429: 190-200.

[38]

Marshall D, Evans A. Measurement of adherence of residually stressed thin films by indentation. I. Mechanics of interface delamination. J Appl Phys, 1984, 56: 2632-2638.

[39]

Kriese MD, Gerberich WW, Moody NR. Quantitative adhesion measures of multilayer films: part I. Indentation mechanics. J Mater Res, 1999, 14: 3007-3018.

[40]

Chen J, Bull S. Indentation fracture and toughness assessment for thin optical coatings on glass. J Phys D Appl Phys, 2007, 40: 5401-5407.

[41]

Chen J, Bull S. Approaches to investigate delamination and interfacial toughness in coated systems: an overview. J Phys D Appl Phys, 2010, 44: 369-379.

[42]

Volinsky A, Moody N, Gerberich W. Interfacial toughness measurements for thin films on substrates. Acta Mater, 2002, 50: 441-466.

[43]

Burnett PJ, Rickerby D. The mechanical properties of wear-resistant coatings: I: modelling of hardness behaviour. Thin Solid Films, 1987, 148: 41-50.

[44]

Li X, Bhushan B. Measurement of fracture toughness of ultra-thin amorphous carbon films. Thin Solid Films, 1998, 315: 214-221.

[45]

Chen J, Bull S. Finite element analysis of contact induced adhesion failure in multilayer coatings with weak interfaces. Thin Solid Films, 2009, 517: 3704-3711.

[46]

Lu M, Huang H (2015) Interfacial adhesion of film/substrate system characterized by nanoindentation. In: Thin films and coatings: toughening and toughness characterization. CRC Press, pp 315–376

[47]

Hudson JA, Harrison JP. Engineering rock mechanics-an introduction to the principles, 2000, Amsterdam: Elsevier

[48]

Abdul-Baqi A, Van der Giessen E. Delamination of a strong film from a ductile substrate during indentation unloading. J Mater Res, 2001, 16: 1396-1407.

[49]

Li X, Bhushan B. Micro/nanomechanical and tribological characterization of ultrathin amorphous carbon coatings. J Mater Res, 1999, 14: 2328-2337.

[50]

Zhang S, Sun D, Fu Y, et al. Toughness measurement of thin films: a critical review. Surf Coat Technol, 2005, 198: 74-84.

[51]

Li X, Diao D, Bhushan B. Fracture mechanisms of thin amorphous carbon films in nanoindentation. Acta Mater, 1997, 45: 4453-4461.

[52]

Liao C, Guo D, Wen S, et al. The assessment of interface adhesion of Cu/Ta/Black Diamond™/Si films stack structure by nanoindentation and nanoscratch tests. Tribol Lett, 2014, 53: 401-410.

[53]

Zhao X, Xie Z, Munroe P. Nanoindentation of hard multilayer coatings: Finite element modelling. Mater Sci Eng A, 2011, 528: 1111-1116.

[54]

Lackner J, Major L, Kot M. Microscale interpretation of tribological phenomena in Ti/TiN soft-hard multilayer coatings on soft austenite steel substrates. Bull Pol Acad Sci Tech Sci, 2011, 59: 343-355.

[55]

Sanchez J, El-Mansy S, Sun B, et al. Cross-sectional nanoindentation: a new technique for thin film interfacial adhesion characterization. Acta Mater, 1999, 47: 4405-4413.

[56]

Elizalde M, Sanchez J, Martinez-Esnaola J, et al. Interfacial fracture induced by cross-sectional nanoindentation in metal–ceramic thin film structures. Acta Mater, 2003, 51: 4295-4305.

[57]

Ocaña I, Molina-Aldareguia J, Gonzalez D, et al. Fracture characterization in patterned thin films by cross-sectional nanoindentation. Acta Mater, 2006, 54: 3453-3462.

[58]

Scherban T, Pantuso D, Sun B, et al. Characterization of interconnect interfacial adhesion by cross-sectional nanoindentation. Int J Fract, 2003, 120: 421-429.

[59]

Heavens O. Some factors influencing the adhesion of films produced by vacuum evaporation. J Phys Radium, 1950, 11: 355-360.

[60]

Deng H, Scharf TW, Barnard JA. Adhesion assessment of silicon carbide, carbon, and carbon nitride ultrathin overcoats by nanoscratch techniques. J Appl Phys, 1997, 81: 5396-5398.

[61]

Wei C, Yen JY. Effect of film thickness and interlayer on the adhesion strength of diamond like carbon films on different substrates. Diam Relat Mater, 2007, 16: 1325-1330.

[62]

Beake B, Harris A, Liskiewicz T. Review of recent progress in nanoscratch testing. Tribol Mater Surf Interfaces, 2013, 7: 87-96.

[63]

Gassilloud R, Ballif C, Gasser P, et al. Deformation mechanisms of silicon during nanoscratching. Phys Status Solidi, 2005, 202: 2858-2869.

[64]

Bakshi SR, Keshri AK, Agarwal A. A comparison of mechanical and wear properties of plasma sprayed carbon nanotube reinforced aluminum composites at nano and macro scale. Mater Sci Eng A, 2011, 528: 3375-3384.

[65]

Lian D. Effect of annealing on the nanoscratch behavior of multilayer Si 0.8 Ge 0.2/Si films. Appl Surf Sci, 2010, 257: 911-916.

[66]

Sun H, Irwan R, Huang H, et al. Surface characteristics and removal mechanism of cemented tungsten carbides in nanoscratching. Wear, 2010, 268: 1400-1408.

[67]

Larsson M, Olsson M, Hedenqvist P, et al. Mechanisms of coating failure as demonstrated by scratch and indentation testing of TiN coated HSS. Surf Eng, 2000, 16: 436-444.

[68]

Steinmann P, Tardy Y, Hintermann H. Adhesion testing by the scratch test method: the influence of intrinsic and extrinsic parameters on the critical load. Thin Solid Films, 1987, 154: 333-349.

[69]

Bellido-Gonzalez V, Stefanopoulos N, Deguilhen F. Friction monitored scratch adhesion testing. Surf Coat Technol, 1995, 74: 884-889.

[70]

Beuth J. Cracking of thin bonded films in residual tension. Int J Solids Struct, 1992, 29: 1657-1675.

[71]

Ramsey P, Chandler H, Page T. Bending tests to estimate the through-thickness strength and interfacial shear strength in coated systems. Thin Solid Films, 1991, 201: 81-89.

[72]

Von Stebut J, Lapostolle F, Bucsa M, et al. Acoustic emission monitoring of single cracking events and associated damage mechanism analysis in indentation and scratch testing. Surf Coat Technol, 1999, 116: 160-171.

[73]

Tang W, Weng X, Deng L, et al. Nano-scratch experiments of Au/NiCr multi-layered films for microwave integrated circuits. Surf Coat Technol, 2007, 201: 5664-5666.

[74]

Beake B, Davies M, Liskiewicz T, et al. Nano-scratch, nanoindentation and fretting tests of 5–80 nm Ta-C films on Si (100). Wear, 2013, 301: 575-582.

[75]

Beake B, Ogwu A, Wagner T. Influence of experimental factors and film thickness on the measured critical load in the nanoscratch test. Mater Sci Eng A, 2006, 423: 70-73.

[76]

Shi B, Sullivan JL, Beake BD. An investigation into which factors control the nanotribological behaviour of thin sputtered carbon films. J Phys D Appl Phys, 2008, 41: 045303.

[77]

Li J, Beres W. Three-dimensional finite element modelling of the scratch test for a TiN coated titanium alloy substrate. Wear, 2006, 260: 1232-1242.

[78]

Holmberg K, Laukkanen A, Ronkainen H, et al. A model for stresses, crack generation and fracture toughness calculation in scratched TiN-coated steel surfaces. Wear, 2003, 254: 278-291.

[79]

Kitamura T, Hirakata H, Itsuji T. Effect of residual stress on delamination from interface edge between nano-films. Eng Fract Mech, 2003, 70: 2089-2101.

[80]

Van Der Laan D, Ekin J, Clickner C, et al. Delamination strength of YBCO coated conductors under transverse tensile stress. Supercond Sci Technol, 2007, 20: 765.

[81]

Sumitomo T, Huang H, Zhou L. Multi-scale deformation and material removal in amorphous Si thin film solar panels. Int J Nanomanuf, 2011, 7: 39-53.

[82]

Zhang C, Ohmori H, Marinescu I, Kato T. Grinding of ceramic coatings with cast iron bond diamond wheel. A comparative study: ELID and rotary dressers. Int J Adv Manuf Technol, 2001, 18: 545-552.

[83]

Murthy J, Rao D, Venkataraman B. Effect of grinding on the erosion behaviour of a WC-Co-Cr coating deposited by HVOF and detonation gun spray processes. Wear, 2001, 249: 592-600.

[84]

Massad RB (1984) Diamond wheel grinding of thermal spray materials. Therm Spray Coat 139–146

[85]

Stephenson D, Hedge J, Corbett J. Surface finishing of Ni-Cr-B-Si composite coatings by precision grinding. Int J Mach Tools Manuf, 2002, 42: 357-363.

[86]

Liu X, Zhang B. Effects of grinding process on residual stresses in nanostructured ceramic coatings. J Mater Sci, 2002, 37: 3229-3239.

[87]

Zhang B, Liu X, Brown C, et al. Microgrinding of nanostructured material coatings. CIRP Ann Manuf Technol, 2002, 51: 251-254.

[88]

Liu X, Zhang B. Grinding of nanostructural ceramic coatings: damage evaluation. Int J Mach Tools Manuf, 2003, 43: 161-167.

[89]

Liu X, Zhang B, Deng Z. Grinding of nanostructured ceramic coatings: surface observations and material removal mechanisms. Int J Mach Tools Manuf, 2002, 42: 1665-1676.

[90]

Bifano TG, Dow TA, Scattergood RO. Ductile-regime grinding: a new technology for machining brittle materials. J Eng Ind, 1991, 113: 184-189.

[91]

Huang H, Liu Y. Experimental investigations of machining characteristics and removal mechanisms of advanced ceramics in high speed deep grinding. Int J Mach Tools Manuf, 2003, 43: 811-823.

[92]

Jackson M, Davis C, Hitchiner M, et al. High-speed grinding with CBN grinding wheels—applications and future technology. J Mater Process Technol, 2001, 110: 78-88.

[93]

Kang CW, Huang H. A comparative study of conventional and high speed grinding characteristics of a thin film multilayer structure. Precis Eng

[94]

Needleman A. A numerical study of necking in circular cylindrical bar. J Mech Phys Solids, 1972, 20: 111-127.

[95]

Needleman A. A continuum model for void nucleation by inclusion debonding. J Appl Mech, 1987, 54: 525-531.

AI Summary AI Mindmap
PDF

175

Accesses

0

Citation

Detail

Sections
Recommended

AI思维导图

/