Finite element analysis of temperature distribution of polycrystalline silicon thin film transistors under self-heating stress

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Front. Electr. Electron. Eng. ›› 2009, Vol. 4 ›› Issue (2) : 227-233. DOI: 10.1007/s11460-009-0023-0
RESEARCH ARTICLE

Finite element analysis of temperature distribution of polycrystalline silicon thin film transistors under self-heating stress

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{{article.zuoZheEn_L}}. {{article.titleEn}}. Front Elect Electr Eng Chin, 2009, 4(2): 227‒233 https://doi.org/10.1007/s11460-009-0023-0

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