Application of atmospheric pressure plasma polishing method in machining of silicon ultra-smooth surfaces

Front. Electr. Electron. Eng. ›› 2008, Vol. 3 ›› Issue (4) : 480 -487.

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Front. Electr. Electron. Eng. ›› 2008, Vol. 3 ›› Issue (4) : 480 -487. DOI: 10.1007/s11460-008-0072-9

Application of atmospheric pressure plasma polishing method in machining of silicon ultra-smooth surfaces

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Abstract

The modern optics industry demands rigorous surface quality with minimum defects, which presents challenges to optics machining technologies. There are always certain defects on the final surfaces of the components formed in convent

Keywords

atmospheric pressure plasma / ultra-smooth surface / single crystal silicon / capacitance coupled / polishing

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null. Application of atmospheric pressure plasma polishing method in machining of silicon ultra-smooth surfaces. Front. Electr. Electron. Eng., 2008, 3(4): 480-487 DOI:10.1007/s11460-008-0072-9

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