Electrochemical capacitance-voltage characterization of plasma-doped ultra-shallow junctions

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Front. Electr. Electron. Eng. ›› 2008, Vol. 3 ›› Issue (1) : 116-119. DOI: 10.1007/s11460-008-0016-4

Electrochemical capacitance-voltage characterization of plasma-doped ultra-shallow junctions

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{{article.zuoZheEn_L}}. {{article.titleEn}}. Front. Electr. Electron. Eng., 2008, 3(1): 116‒119 https://doi.org/10.1007/s11460-008-0016-4

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