TY - Front. Chem. Sci. Eng. A1 - Romain Chanson, Remi Dussart, Thomas Tillocher, P. Lefaucheux, Christian Dussarrat, Jean François de Marneffe T1 - Low-k integration: Gas screening for cryogenic etching and plasma damage mitigation Y1 - 2019-09-15 JF - Frontiers of Chemical Science and Engineering JO - Front. Chem. Sci. Eng. SP - 511 EP - 516 VL - 13 IS - 3 UR - https://journal.hep.com.cn/fcse N1 - 10.1007/s11705-019-1820-5 ER -